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Holes are majority carriers in n-type semiconductor while electrons are majority carries in p-type semiconductor.

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Important Questions on Semiconductor Electronics: Materials, Devices and Simple Circuits

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Mobility of electrons in a semiconductor is defined as the ratio of their drift velocity to the applied electric field. If, for an N-type semiconductor, the density of electrons is 1019 m-3 and their mobility is 1.6 m2 V-1 s-1, then the resistivity of the semiconductor (since it is an N-type semiconductor contribution of holes is ignored) is close to:
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An intrinsic semiconductor is converted into n-type extrinsic semiconductor by doping it with:-
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An extrinsic semiconductor with electrons as majority carriers can be obtained by doping Ge or Si with
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In a semiconductor, the concentration of minority carriers depends mainly on
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For a p-type semiconductor, which of the following statements is true?
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In a p-type semiconductor, the concentration of holes is 2×1015 cm-3. The intrinsic carrier concentration is 2×1010 cm-3. The concentration of electrons will be
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What are the majority and minority carriers in a p-type semiconductors
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Intrinsic carrier concentration of a silicon sample at 300 K is 1.5×1016 m-3. After doping, the number of majority carriers is 2.25×1020 m-3. The minority carrier density is
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The electron concentration in an undefined n-type semiconductor is the same as hole concentration in a undefined p-type semiconductor. An external field (electric) is applied across each of them. Compare the currents in them.
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A semiconductor has equal electron and hole concentration 6×108 m-3. On doping with a certain impurity electron concentration increases to 9×1012 m-3. Calculate the new hole concentration.  Also identify the new semiconductor.
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Statement I: By doping silicon semiconductors with pentavalent material, the electrons density increases.

Statement II: The n-type of semiconductor has a net negative charge.

In the above statements, choose the most appropriate answer from the options given below:

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The dominant contribution to current comes from holes in case of
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The intrinsic carrier concentration in silicon at T=300 K is known to be ni=1.5×1016 m-3. A sample of silicon is doped with 5×1022 m-3 arsenic (a group V element). Under these circumstances the concentrations of electrons (n) and holes (p) in the sample are
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When indium is doped to silicon as impurity, the resulting material is
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The density of an electron-hole pair in pure germanium is 3×1016 m-3 at room temperature. On doping with aluminium, the hole density increases to 4.5×1022 m-3. Now the electron density (in m-3 ) in doped germanium will be