MEDIUM
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Which communication network is characterized by a single central authority?

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Important Questions on Electrostatic Potential and Capacitance

EASY
If A is a matrix of order 3×2, and order of the matrix A' is m×n, then m+n=_____
HARD
Two cells of emf E1 and E2 have their internal resistance r1 and r2 respectively. Deduce an expression for the equivalent emf and internal resistance of their parallel combination when connected across an external resistance R assume that the two cells are supporting each other.
EASY

FInd the number of all possible matrices of order

3×3 with each entry 0 or 1.

MEDIUM
The number of possible matrices of order 3×3 with each entry 0 or 1 is
MEDIUM

In case two cells are identical, each of emf E=5 V and internal resistance r=2 Ω, calculate the voltage across the external resistance R=10 Ω

EASY
Mobilities of electrons and holes in a sample of intrinsic germanium at room temperature are 0.54 m2v-1s-1 and 0.18 m2v-1s-1 respectively. If the electron and hole densities are equal to 3.6×1019 m-3, calculate the germanium conductivity. Take, e = 1.6×10-19 C
EASY
Why are elemental dopants for Silicon or Germanium usually chosen from group XIII or group XV?
MEDIUM
Suppose a n-type wafer is created by doping Si crystal having 5×1028 atoms/m3 with 1ppm concentration of As. On the surface 200 ppm Boron is added to create P region in this wafer.Considering ni = 1.5 × 1016 m3, (i) Calculate the densities of the charge carriers in the n & p regions. (ii) Comment which charge carriers would contribute largely for the reverse saturation current when diode is reverse biased.
EASY
In a n-type silicon, which of the following statement is true:
MEDIUM
A semiconductor has the electron concentration of 8×1013 cm-3 and hole concentration of 4×1013 cm-3. Is the semiconductor p-type or n-type? Also, calculate the resistivity of this semiconductor. Given electron mobility =24,000 cm2 V-1 s-1 and hole mobility =200 cm2 V-1 s-1
EASY
A semiconductor is known to have an electron concentration of 8 ×1013 cm-3 and a hole concentration of 5 ×1012 cm-3 . The semiconductor is
EASY
What type of impurity is added to obtain n-type semiconductor?
EASY
Pure silicon at 300 K has equal electron and hole concentrations of 1.5×1016 m-3. Doping by indium increases the hole concentration to 4.5×1022 m-3. Calculate the new electron concentration in the doped silicon.
EASY
What type of charge carriers are there in an n-type semiconductor?
EASY
Determine the number density of donor atoms which have to be added to an intrinsic germanium to produce an n-type semiconductor of conductivity 0.06 Sm-1. Given the mobility of electrons =0.39 m2V-1s-1. Neglect the contribution of holes to the conductivity. Take: e = 1.6×10-19 C
MEDIUM
The resistivity of pure germanium at a particular temperature is 0.52 Ωm. If the material is doped with 1020 atoms per m-3 of a trivalent impurity material, determine the new resistivity. The electron and hole mobilities are given to be 0.2 m2V-1s-1 and 0.4 m2V-1s-1 respectively. Take e = 1.6×10-19 C.
MEDIUM
A silicon specimen is made into a p-type semiconductor by doping, on an average, one indium atom per 5×107 silicon atoms. If the number density of atoms in the silicon specimen is 5×1028 atoms m-3, then the number of acceptor atoms in silicon per cubic centimeter will be